Herbert, S., Banyay, M., Maryasov, A. P., Hochschulz, F., Paschen, U., Vogt, H., Juschkin, L.
Quantum efficiency determination of a novel CMOS design for fast imaging applications in the extreme ultraviolet.
IEEE Transact. Electron Dev. Online first 4 S. (2012)

Farahzadi, A., Lebert, R., Benk, M., Juschkin, L., Herbert, S., Maryasov, A.:
Contributions to EUV mask metrology infrastructure.
Proc. SPIE 7545, 754505 (5 S.), 2011

Freiberger, R., Hauck, J., Reininghaus, M., Wortmann, D., Juschkin, L.:
Time resolved EUV pump-probe microscopy of fs-LASER induced nanostructure formation.
Proc. SPIE 8076, 80760K (7 S.), 2011

Hauck, J., Freiberger, R., Juschkin, L.:
Performance benchmark of a gateable microchannel plate detector for extreme ultraviolet radiation with high temporal resolution.
Proc. SPIE 8076, 80760R (7 S.), 2011

Juschkin, L., Maryasov, A., Herbert, S., Aretz, A., Bergmann, K., Lebert, R.:
EUV dark-field microscopy for defect inspection.
AIP Conf. Proc. 1365, 265-268, 2011

Maryasov, A., Herbert, S., Juschkin, L., Lebert, R., Bergmann, R.:
EUV actinic mask blank defect inspection: results and status of concept realization.
Proc. SPIE 7985, 79850C (8 S.), 2011

Banyay, M., Juschkin, L.
Spectral sharpening algorithm for a polychromatic reflectometer in the extreme ultraviolet
Appl. Spectrosc. 64, 401-408
2010

Verbraak, H., Küpper, F., Jonkers, J., Bergmann, K.
Angular ion emission characteristics of a laser triggered tin vacuum arc as light source for extreme ultraviolet lithography
J. Appl. Phys. 93304, (6 S.)
2010

Wortmann, D., Reininghaus, M., Juschkin, L., Freiberger, R.
EUV-pump-probe microscopy of FS-Laser induced nano-structure formation
ICALEO 2010. 29th International Congress on Applications of Lasers & Electro Optics, Anaheim/Ca., September 26-30, 2010. N107 (4 S.)
2010

M. Benk, K. Bergmann
Adaptive spatially resolving detector for the extreme ultraviolet with absolute measuring capability
Rev. Sci. Instr.
80, 331131-331136, 2009

M. Banyay, L. Juschkin, P. Loosen, M. Roeckerath, J. Schubert
Characterization of ultra-thin layers in MOS-devices with XUV reflectometry
JARA FIT Jülich-Aachen Research Alliance for Fundamentals of Future Information Technology - Annual Report 2008
pp. 47-48, 2009

L. Juschkin, R. Freiberger, K. Bergmann
EUV microscopy for defect inspection by dark-field mapping and zone plate zooming
J. Phys.: Conf. Ser.
186, 1-3, 2009

M. Benk, D. Schäfer, T. Wilhein, K. Bergmann
High power soft x-ray source based on a discharge plasma
J. Phys.: Conf. Ser.
186, 012024 (3 S.), 2009

M. Banyay, S. Brose, L. Juschkin
Line image sensors for spectroscopic applications in the extreme ultraviolet
Meas. Sci. Technol. 20, 105201 (5 S.), 2009

D. Schäfer, M. Benk, K. Bergmann, T. Nisius, U. Wiesemann, T. Wilhein
Optical setup for tabletop soft X-ray microscopy using electrical discharge sources
J. Phys.: Conf. Ser.
186, 063507 (3 S.), 2009

K. Bergmann, S.V. Danylyuk, L. Juschkin,
Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm
J. Appl. Phys.
106, 073309 (5 S.), 2009

M. Banyay, L. Juschkin
Table-top reflectometer in the extreme ultraviolet for surface sensitive analysis
Appl. Phys. Lett.
94, 1-3, 2009

L. Juschkin, R. Freiberger
Two magnification steps EUV microscopy with a Schwarzschild objective and an adapted zone plate lens
Proc. SPIE
7360, 736005 (8 S.), 2009

S. Danylyuk, L. Juschkin, S. Brose, K. Bergmann, P. Loosen [u.a.]
XUV interference lithography for sub-10 nm patterning
JARA FIT Jülich-Aachen Research Alliance - Annual Report 2008
pp. 49-50, 2009

M. Banyay, L. Juschkin, T. Bücker, P. Loosen [u.a.]
XUV metrology: Surface analysis with Extreme Ultraviolet Radiation
Proc. SPIE
7361, 736113-1-736113-12, 2009

M. Benk, K. Bergmann, D. Schäfer, T. Wilhein
Compact soft x-ray microscope using a gas-discharge light source
Opt. Lett.
33, Nr 20, 2359-2361, 2008

L. Juschkin, G. Derra, K. Bergmann
EUV light sources
Low Temperature Plasmas. Ed. R. Hippler. u.a. 2. ed.
Weinheim: Wiley-VCH 2008
pp. 619-654

K. Bergmann, L. Juschkin, R. Poprawe
Extreme ultraviolet lithography
Nanotechnology. Vol. 3: Information Technology I. Ed.: R. Waser
Weinheim: Wiley-VCH 2008
pp. 181-208

E. Wagenaars, A. Mader, K. Bergmann, J. Jonkers, W. Neff
Extreme ultraviolet plasma source for future lithography
IEEE Trans. Plasma Sci.
36, Nr 4, 1280-1281, 2008

M. Banyay, L. Juschkin
Innovative approaches to surface sensitive analysis techniques on the basis of plasma-based off-synchrotron XUV/EUV light sources
Proc. SPIE
7077, 707714-707723, 2008

E. Wagenaars, F. Küpper, J. Klein, W. Neff, M. Damen, P. van der Wel, D. Vaudrevange, J. Jonkers
Power scaling of an extreme ultraviolet light source for future lithography
Appl. Phys. Lett.
92, 181501-1-181501-3, 2008

M. Corthout, R. Apetz, J. Brudermann, M. Damen, G. Derra, O. Franken, J. Jonkers, J. Klein, F. Küpper, A. Mader, W. Neff [u.a.]
Sn DPP source-collector modules: status of alpha resources, beta developments, and the scalability to HVM
Proc. SPIE
6921,69210, 2008

K. Bergmann, F. Küpper, M. Benk
Soft x-ray emission from a pulsed gas discharge in a pseudosparklike electrode geometry
J. Appl. Phys.
103, 123304-1-12304-8, 2008

G. Bianucci, A. Brunton, G.L. Cassol, G. Pirovano, F. Zocchi, A. Mader, O. Franken, K. Bergmann, H. Scheuermann, P. Zink
Thermal and optical characterization of collectors integrated in an Sn-DPP based SoCoMo
Proc. SPIE
6921, 692112-692120, 2008

R. Schmitt, B.E. Damm, L. Juschkin
Mit weicher Röntgenstrahlung hochgenau messen
In: Optische Messung technischer Oberflächen in der Praxis
Düsseldorf: VDI-Verl.
VDI-Berichte 1996
329-337, 2007