Experts at Fraunhofer ILT develop and evaluate beam sources for EUV lithography and the corresponding measurement technology. Plasma sources driven by high-power lasers generate the extreme ultraviolet radiation used to pattern state-of-the-art semiconductors and are a key component in the miniaturization of electronics.
In addition to nanoscale patterning, assembly and interconnection technology plays a crucial role in high-performance electronic components. Together with industry partners, Fraunhofer ILT is developing, for example, new interconnection techniques for battery contacts and power components.
Fraunhofer ILT also has expertise in the structuring and functionalization of surfaces and in 3D volume structuring. For example, microscopic structures can be introduced into glass or sapphire substrates by selective laser etching, structures that can be used to create microfluidic systems for biochemical analyses.