EUV Measurement Technology

Our range of services

Many applications in metrology need intense radiation in the extreme ultraviolet (EUV). Short-wave radiation with wavelengths in the range of 2 to 50 nm opens up new possibilities in the field of analysis and structuring of surfaces on the nanometer scale. The spectral range around 13.5 nm is of particular importance for the semiconductor industry since corresponding radiation can be used to create and analyze structures relevant to computer chips.

Fraunhofer ILT develops both application-adapted sources that provide radiation in the EUV range as well as highly sensitive metrological processes. EUV spectrometers can be used, for example, to determine the reflectance of material samples and nanostructured samples. Model-based methods can reconstruct the optical constants and other geometric and chemical properties of the samples under investigation. These include structural dimensions of periodic surface structures, layer thicknesses and roughnesses of multilayer systems as well as the stoichiometry and density of materials.

Areas where these processes can be applied include EUV lithography, nanostructuring, X-ray microscopy and reflectometry for surface analysis. Fraunhofer ILT also develops EUV spectrometers which, thanks to their compact design, are also suitable for direct process monitoring, for instance, in semiconductor production. In addition, plasma spectroscopy is used to sort metal scrap into pure fractions.

The range of services we offer includes feasibility studies for customer-specific tasks, the development of EUV technology and integration into manufacturing processes, as well as individual consulting.

Experimental setup of an EUV spectrometer.
© Fraunhofer ILT, Aachen, Germany.
Experimental setup of an EUV spectrometer.
Measured EUV spectrum.
© Fraunhofer ILT, Aachen, Germany.
Measured EUV spectrum.
EUV camera for the measurement of intensity distributions at a wavelength of 13.5 nm.
© Fraunhofer ILT, Aachen, Germany.
EUV camera for the measurement of intensity distributions at a wavelength of 13.5 nm.

Plasma-Based EUV Beam Sources

  • Radiation sources for EUV lithography
  • Radiation sources for X-ray microscopy
  • Power electronics
  • Generators for high pulsed currents, fast data acquisition and control of pulsed radiation sources

Plasma Generation and Diagnostics

  • Gas discharge and laser induced plasmas
  • Spectroscopy from the soft X-ray to the IR range
  • Analysis of radiation fluxes
  • Analysis of plasma parameters
  • High-speed photography
  • Plasma modeling

System Solutions

  • Design of optical systems for EUV applications
  • Optics simulation
  • Integration of plasma-based radiation sources
  • Realization of complete systems
  • Systems for accelerated lifetime testing of EUV components

Applications with EUV Radiation

  • X-ray microscopy
  • EUV microscopy for mask inspection
  • EUV reflectometry, analysis of surfaces and layer systems
  • Nanostructuring with interference lithography


Laser technology can solve demanding tasks in many different industries. Whether as a tool in automotive production, as measuring equipment in the environmental sector, as a diagnostic or therapeutic instrument in medical technology or as a communication medium in space technology, the laser provides multiple uses with high productivity and high efficiency.

Read up about the innovations of the Fraunhofer ILT in a few selected industries and convince yourself!


Research with us!

Please do not hesitate to contact us if you have any questions about general topics! Our contact persons are happy to get in touch with you.

Our services cover a wide range of topics. Related topics and further research and development projects can be found under the following links.