Our range of services
Many applications in metrology need intense radiation in the extreme ultraviolet (EUV). Short-wave radiation with wavelengths in the range of 2 to 50 nm opens up new possibilities in the field of analysis and structuring of surfaces on the nanometer scale. The spectral range around 13.5 nm is of particular importance for the semiconductor industry since corresponding radiation can be used to create and analyze structures relevant to computer chips.
Fraunhofer ILT develops both application-adapted sources that provide radiation in the EUV range as well as highly sensitive metrological processes. EUV spectrometers can be used, for example, to determine the reflectance of material samples and nanostructured samples. Model-based methods can reconstruct the optical constants and other geometric and chemical properties of the samples under investigation. These include structural dimensions of periodic surface structures, layer thicknesses and roughnesses of multilayer systems as well as the stoichiometry and density of materials.
Areas where these processes can be applied include EUV lithography, nanostructuring, X-ray microscopy and reflectometry for surface analysis. Fraunhofer ILT also develops EUV spectrometers which, thanks to their compact design, are also suitable for direct process monitoring, for instance, in semiconductor production. In addition, plasma spectroscopy is used to sort metal scrap into pure fractions.
The range of services we offer includes feasibility studies for customer-specific tasks, the development of EUV technology and integration into manufacturing processes, as well as individual consulting.