Our range of services
Miniaturization in the electronics and semiconductor industries, among others, increasingly requires metrological and lithographic processes that can detect and modify fine structures in the nanometer and subnanometer range. Here, radiation with very short wavelengths in the EUV (extreme ultraviolet) range – for example, 13.5 nm – is used to manufacture highly precise and complex structural arrangements.
For this purpose, Fraunhofer ILT is developing EUV radiation sources and corresponding methods for material processing and analysis. The EUV technologies are highly sensitive to structures with nanoscale dimensions and can be used advantageously in semiconductor manufacturing. This requires novel photoresists that must simultaneously demonstrate both high sensitivity and high resolution. The EUV exposure system developed at ILT can support the development of such materials in a cost-efficient way.
The range of services we offer includes feasibility studies for customized tasks, the development and realization of customized exposure tools, investigations on the behavior of photoresists and other materials under EUV irradiation, the integration of EUV lithography into manufacturing processes, and individual consulting.